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DTSTART:18871231T000000
DTSTART:19881009T020000
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BEGIN:VEVENT
DTSTAMP:20230103T035306Z
LOCATION:Auditorium\, Level 5\, West Wing
DTSTART;TZID=Asia/Seoul:20221206T100000
DTEND;TZID=Asia/Seoul:20221206T120000
UID:siggraphasia_SIGGRAPH Asia 2022_sess153_papers_241@linklings.com
SUMMARY:Fast Editing of Singularities in Field-Aligned Stripe Patterns
DESCRIPTION:Technical Papers\n\nFast Editing of Singularities in Field-Ali
 gned Stripe Patterns\n\nNoma, Umetani, Kawahara\n\n\textit{Field-aligned p
 arametrization} is a method that maps a scalar function onto a surface, su
 ch that the gradient vector of the scalar function matches the input vecto
 r field. Using this idea, one can produce a stripe pattern that is conveni
 ent for various purposes such as remeshing, texture synthesis, and computa
 tional fabrication. In the final outcome, the positions of singularities (
 i.e., bifurcations of the stripe pattern) are essential for functionalitie
 s, manufacturability, or aesthetics. In this paper, we propose an algorith
 m to allow users to interactively edit the singularity positions of field-
 aligned stripe patterns. The algorithm computes a stripe pattern from a pr
 escribed set of singularities, without generating any unwanted singulariti
 es. The solution of the algorithm is formulated as the global minima of a 
 constrained quadratic optimization, whose computation speed is dominated b
 y solving only two sparse linear systems. Furthermore, once the two matric
 es in the two linear systems are factorized, any update on singularity pos
 itions operates in linear time. We showcase several applications feasible 
 with our fast yet simple algorithm.\n\nRegistration Category: FULL ACCESS,
  EXPERIENCE PLUS ACCESS, EXPERIENCE ACCESS, TRADE EXHIBITOR\n\nLanguage: E
 NGLISH\n\nFormat: IN-PERSON
URL:https://sa2022.siggraph.org/en/full-program/?id=papers_241&sess=sess15
 3
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