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DTSTART:18871231T000000
DTSTART:19881009T020000
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BEGIN:VEVENT
DTSTAMP:20230103T035312Z
LOCATION:Room 324\, Level 3\, West Wing
DTSTART;TZID=Asia/Seoul:20221209T090000
DTEND;TZID=Asia/Seoul:20221209T103000
UID:siggraphasia_SIGGRAPH Asia 2022_sess172_papers_241@linklings.com
SUMMARY:Fast Editing of Singularities in Field-Aligned Stripe Patterns
DESCRIPTION:Technical Communications, Technical Papers\n\nFast Editing of
Singularities in Field-Aligned Stripe Patterns\n\nNoma, Umetani, Kawahara\
n\n\textit{Field-aligned parametrization} is a method that maps a scalar f
unction onto a surface, such that the gradient vector of the scalar functi
on matches the input vector field. Using this idea, one can produce a stri
pe pattern that is convenient for various purposes such as remeshing, text
ure synthesis, and computational fabrication. In the final outcome, the po
sitions of singularities (i.e., bifurcations of the stripe pattern) are es
sential for functionalities, manufacturability, or aesthetics. In this pap
er, we propose an algorithm to allow users to interactively edit the singu
larity positions of field-aligned stripe patterns. The algorithm computes
a stripe pattern from a prescribed set of singularities, without generatin
g any unwanted singularities. The solution of the algorithm is formulated
as the global minima of a constrained quadratic optimization, whose comput
ation speed is dominated by solving only two sparse linear systems. Furthe
rmore, once the two matrices in the two linear systems are factorized, any
update on singularity positions operates in linear time. We showcase seve
ral applications feasible with our fast yet simple algorithm.\n\nRegistrat
ion Category: FULL ACCESS, ON-DEMAND ACCESS\n\nLanguage: ENGLISH\n\nFormat
: IN-PERSON, ON-DEMAND
URL:https://sa2022.siggraph.org/en/full-program/?id=papers_241&sess=sess17
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